会议介绍

Conference Introduction

In recent years, the combination of emerging functional materials and devices such as wide bandgap semiconductors and ultra-wide bandgap semiconductors with advanced processes like heterogeneous integration and 3D packaging has been driving semiconductor technology toward diversified innovation and accelerated iteration. These technologies are fostering a new generation of high-performance, low-power, and multifunctionally integrated semiconductor solutions.

The 13th Forum on Semiconductor Devices and Fabrication Technology will be sponsored by the Bureau of Personnel, CAS, and organized by the Nano-Fabrication Facility at Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), CAS, and co-organized by Shanghai Regional Center of Materials and Manufacturing Instruments and Suzhou Nano Technology Development Co., Ltd. The Forum will be held at the Suzhou International Expo Centre from October 22nd to 24th, 2025.

The Forum invites renowned experts specializing in new semiconductor materials, devices, and heterogeneous integration technologies from universities, research institutes, and enterprises to share their professional knowledge, thoroughly analyze the technical challenges of new semiconductor materials and devices, and explore the latest trends in advanced heterogeneous integration technologies. The forum will feature both theoretical training and technical discussions, delivered in an accessible and in-depth manner.

This Forum is intended as a public training event, aiming to provide an opportunity for technical personnel in related industries to learn and communicate. Attendance is free but limited in number. We warmly welcome college students, R&D engineers, and scientific researchers to register and participate.

Organization

Host

    • Bureau of Personnel, CAS

Organizers

    • Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), CAS

Co-organizers

    • Shanghai Regional Center of Materials and Manufacturing Instruments
    • Nanopolis Suzhou Co., Ltd

Main topics

Topics discussed at this meeting included but are not limited to:

2024 Agenda Review

2024 Agenda Review

Date: Oct. 23
Location: A108, Suzhou International Expo Center
Moderator: Zhongming Zeng, Professor of Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences, Director of the Nano-Fabrication Facility
Date: Oct. 24
Location: A108, Suzhou International Expo Center
Moderator: Baoshun Zhang, Professor of Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences
Moderator: Wenhua Shi, Professor of Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences, Vice Director of the Nano-Fabrication Facility
Date: Oct. 25
Location: Nano-Fabrication Facility & MEMSRIGHT
The 13th Forum on Semiconductor Devices and Fabrication Technology——Key Technology and Fabrication of New Display Devices
Speaker
Linsen Chen
Professor of Soochow University, President of SVG Tech Group Co., Ltd.

Biography:Prof. Chen Linsen has been engaged in the research and applications of micro-nano optics and flexible manufacturing for more than thirty-years, and is the founder of SVG TechGroup. His research achievements in the digital lithographic technologies, R2R nanoimprinting systems, optical security, micro-materials and devices are widely applied in novel display and semiconductive industries domestically and abroad. As the host, he has won the National Science and Technology Progress Award three times and the China Patent Excellence Awards. He was awarded the title of "Contemporary Inventor" and the 4th "Outstanding Engineer Award", and has authorized more than 200 patents and published more than 190 papers in the related fields. His project in the novel display has approved as National Key R&D Program of China.

Abstract:The next decade will be the key innovation and industrial growth period of the metaverse, virtual and augmented display. Facing the trend of novel displays, it is pointed out that the functionalization of large-area micro-nano structures is the key technology to promote the new materials and devices in the display industry. This reports introduces the micro-nano light-manufacturing technologies, including the digital 3D-lithography and related algorithms, and UV nanoimprint lithography, for the micro-devices to achieve the energy-saving and high performances. The research progress of micro-nano light-manufacturing in glasses-free 3D display, spatial transparent augmented display, flexible transparent conductive materials and high-efficiency light guide devices is enumerated.  The Micro-nano light manufacturing is expected to become a platform technology to promote the innovation and development of key materials and transformative devices in the upstream of novel display.

The 13th Forum on Semiconductor Devices and Fabrication Technology——Key Technology and Fabrication of New Display Devices
Speaker
Anlian Pan
Vice President, Professor of Hunan Normal University

Biography: Prof. Anlian Pan is the Vice President of Hunan Normal University and the Director of the Hunan Institute of Optoelectronic Integration. He has received funding for the National Natural Science Foundation Innovative Research Group Project, the National Distinguished Young Scholars, and the Ministry of Science and Technology’s Major Research Program. He has published over 400 papers in renowned international journals such as Science, Nature Nanotechnology, Nature Electronics, and Nature Materials and has been granted more than 40 invention patents. He was awarded the National Nature Science Award (2nd class) in 2019, the Hunan Province Natural Science Award (1st Prize) in 2010 and 2017, the Hunan Province Innovation Team Award in 2022, the Hunan Innovation Team Award in 2022, the Winner of the Disruptive Technology Competition in 2022, and the Gold Medal at the China Invention Exhibition in 2024.

Abstract: The rapid development of digital internet technology has driven continuous transformation and upgrading of display technology. The advent of the Metaverse era demands higher standards for display technology in terms of energy efficiency, brightness, reliability, and wearability, aiming to achieve a seamless and natural digital display experience. Micro-LED is a revolutionary new display technology that can meet the significant demands of next-generation smart displays for high pixel density and high brightness light-emitting devices.

This report will mainly introduce our major research progress in the micro display field. We have developed processes such as sidewall passivation and surface nanopatterning to overcome the construction bottleneck of small-sized light-emitting devices. By optimizing carrier injection, transport, and recombination behaviors, we have achieved ultra-small (1.5 micrometers), high-efficiency vertically structured silicon-based micro light-emitting device arrays. We have also developed a three-dimensional stacked monolithic integration process (VSP), successfully applying silicon-based semiconductor integrated circuit processes to the development of micro light-emitting display chips. We have developed the world’s smallest (grain-sized) micro display screen driven by a single point CMOS, with a pixel density of up to 10,000 PPI and brightness exceeding 1 million nits. These related achievements have been promoted and applied by companies such as TCL Thunderbird.

The 13th Forum on Semiconductor Devices and Fabrication Technology——Key Technology and Fabrication of New Display Devices
Speaker
Ke Zhang
Director of Technical Center of Shenzhen Sitan Technology Co., Ltd.
The 13th Forum on Semiconductor Devices and Fabrication Technology——Key Technology and Fabrication of New Display Devices
Speaker
Lei Liao
Professor of Hunan University

Biography:Prof. Lei Liao is currently a Professor in College of Semiconductors (College of Integrated Circuits), Hunan University, China. He obtained his B.S. in physics in 2004 and Ph.D. in physics in 2009 at Wuhan University. He joined the School of Physics at Wuhan University in 2011 as a Professor after postdoctoral research at University of California, Los AngelesProf. Liao has carried out the studies on the heterogeneous integration and device architecture based on 2D semiconductors and metal oxide thin film transistors. So far, he has published more than 200 papers in SCI journals, including Nature, Nature Nano., Nature Electron., Nature Commun., Nano Lett., and Adv. Mater., and so on. Meanwhile, all these papers have been cited more than 20000 times by others, and the corresponding H factor is 81. He has been appointed as editors or editorial board members of IEEE TEDFrontier of PhysicsJournal of Semiconductor, and Chinese Physics Letters. His awards include the First Prize of Science and Technology Award of Hunan Province and Ministry of Education, etc.

Abstract:Metal oxide semiconductor (MOS)-based complementary thin-film transistor (TFT) circuits have broad application prospects in large-scale flexible electronics. To simplify circuit design and increase integration density, basic complementary circuits require both p- and n-channel transistors based on an individual semiconductor. However, until now, no MOSs that can simultaneously show p- and n-type conduction behavior has been reported. Herein, we demonstrate for the first time that Cu-doped SnO (Cu:SnO) with HfO2 capping can be employed for high performance p- and n-channel TFTs. The interstitial Cu+ can induce an n-doping effect while restraining electronelectron scatterings by removing conduction band minimum degeneracy. As a result, the Cu3atom%:SnO TFTs exhibit a record high electron mobility of 43.8 cm2 V1 s1. Meanwhile, the p-channel devices show an ultrahigh hole mobility of 2.4 cm2 V1 s1. Flexible complementary logics are then established, including an inverter, NAND gates, and NOR gates. Impressively, the inverter exhibits an ultrahigh gain of 302.4 and excellent operational stability and bending reliability.

The 13th Forum on Semiconductor Devices and Fabrication Technology——Key Technology and Fabrication of New Display Devices
Speaker
Yongyin Kang
Professor of Yiwu Research Institute, Fudan University

Biography:Kang Yongyin is a researcher of Yiwu Research Institute of Fudan University and director of the Photoelectric Materials and Devices Laboratory. Graduated from Shanghai Institute of Microsystems and Information Technology, Chinese Academy of Sciences in 2010, and graduated from the postdoctoral mobile station of Zhejiang University in 2017. Since 2010, he has been working in Najing Technology Co., Ltd., as a technical director / senior engineer.

In June 2023, he joined the Yiwu Research Institute of Fudan University and established the Photoelectric Materials and Devices Laboratory.

Abstract:The 2023 Nobel Prize in Chemistry was awarded to Bawendi, Brus and Ekimov for their outstanding contributions to the "discovery and synthesis of quantum dots". And quantum dot technology has taken the lead in display industry application, from quantum dot glass tube to quantum dot light conversion film and quantum dot diffusion plate, quantum dot backlight with liquid crystal brought color gamut promotion and excellent quality experience. And a new generation of quantum dot pixel level application QD OLED products also launched by Samsung Display and widely praised, QD µLED and QD EL application also received the attention of academia and industry and pursuit, the broad application prospects and challenges of quantum dot were introduced in this report.

The 13th Forum on Semiconductor Devices and Fabrication Technology——Key Technology and Fabrication of New Display Devices
Speaker
Junqi Yuan
President of the Board of Tripole Optoelectronic Technology (Suzhou) Co., Ltd.

Biography:
Tripole Optoelectronic Technology (Suzhou) Co., Ltd   CEO

Jinan University graduate collaborative training base   Extramural Supervisor;

Senior substantive expert on holographic diffractive optics

PROJECT EXPERIENCE

Yuan has applied for more than 30 national patents, and has rich experience in the design, manufacturing and mass production process of holographic optical components.

1. Leading the development of opto-mechanical systems with special holographic optical components, and the performance of various products has been professionally tested at the top level in China.

2. Lead the development of the waveguide simulation design tool "Wade" and the research and development project of high-performance holographic waveguide helmet display. 

3. Lead the development project of large-area holographic diffractive optical waveguide and the development of large-angle retinal holographic optical elements.

Abstract:Holographic diffractive optics belongs to the broad field of semiconductors and is an interdisciplinary fundamental science that encompasses holographic photolithography materials, non-sequential vector subwavelength device software and design, holographic interference light field modulation, and processes. It has a wide range of applications in areas such as holographic display, holographic storage, measurement, testing, reference positioning, scanning, targeting, and security and encryption. These applications span various multi-billion, multi-trillion-dollar industries, including advanced semiconductor photolithography machines, aviation, missile guidance and tracking, soldier combat, automotive, AR metaverse, consumer electronics, and biomedical instruments.It has attracted increasing attention from industries in recent years. This report elaborates on holographic diffractive optics in terms of materials, simulation and design, fabrication processes, and market applications.

The 13th Forum on Semiconductor Devices and Fabrication Technology——Key Technology and Fabrication of New Display Devices
Speaker
Qian Fan
Vice president of Suzhou HanHua Semiconductor Co., Ltd.

Biography:Dr. Fan Qian graduated from Virginia Commonwealth University with a degree in Electronic Engineering. He has more than 15 years of experience in the semiconductor chip process industry in the United States. Before returning to China, he served as the Director of R&D at Ostendo Technologies Inc. Currently, he is the Vice President of Suzhou Hanhua Semiconductor Co., Ltd., focusing on the research of semiconductor chip process, 3DIC, wafer bonding, wide bandgap semiconductor materials, etc. He led the R&D team in using an innovative 3DIC hybrid integration technology to perform hetero-wafer bonding between gallium nitride (GaN) LEDs and CMOS integrated circuits, achieving the illumination of a 3×4 micrometer Micro LED array and the demonstration of video streaming.

Abstract:As a new generation of display technology, Micro-LED is regarded as an important development direction of future display technology due to its advantages of high brightness, high contrast, low power consumption, and long life. The introduction of 3DIC technology has brought more innovative opportunities and broad application prospects to the field of Micro-LED micro-display. While briefly introducing the development process of 3DIC technology, this topic focuses on its key semiconductor process technology, and briefly introduces its application and research in the field of Micro-LED micro-display.

The 13th Forum on Semiconductor Devices and Fabrication Technology——Key Technology and Fabrication of New Display Devices
Speaker
Wei Xia
Professor of University of Jinan, Technical Adviser of Shandong Huaguang Optoelectronics Co., Ltd.

Biography:Xia Wei, Professor and doctoral supervisor at the University of Jinan, technical advisor at Shandong Huaguang Optoelectronics Co., Ltd., director of the Shandong Provincial Semiconductor Laser Technology Innovation Center. He specializes in compound semiconductor laser chips, devices, and applications. Professor Xia has led over twenty major projects, including the National Key R&D Program and the National "863 Program." His accolades include multiple Shandong Provincial Science and Technology Progress Awards, the Shandong Provincial Technological Invention Award, and the China Invention Association’s Invention and Innovation Award. He has been recognized as the Outstanding Young and Middle-aged Expert in Shandong Province, the Outstanding Scientific and Technological Worker by the Chinese Institute of Electronics, the Qilu Industry Craftsman, and the Top Technical Talent of Jinan.

Abstract:The 640-670nm semiconductor laser chips are known for their compact size, reliability, and high electro-optical conversion efficiency, making them ideal for laser display and projection applications. To achieve a higher color gamut, the industry relies on 640nm wavelength semiconductor lasers as the core of RGB synthetic laser sources, creating an urgent demand for high-power red semiconductor laser chips.

Through low-loss compound epitaxial layer growth and optimized chip design, we have improved the efficiency and output power of 640nm high-power semiconductor laser chips. Using high-quality AlGaInP heterojunction MOCVD epitaxial growth technology, we achieved a maximum output power of over 4W per single chip and an electro-optical conversion efficiency of 38%. The lasers demonstrated stable operation for 1000 hours at a shell temperature of 40℃ without power degradation, meeting the demands of laser projection, display, and measurement. Additionally, we developed a long-lifetime 670nm-10mW base transverse mode laser chip reliable in high-temperature environments up to 85℃. The chip showed continuous operation for 5040 hours with less than 15% average power decline, meeting the high-reliability requirements for laser measurement, sensing, projection, and lighting applications.

The 13th Forum on Semiconductor Devices and Fabrication Technology——Key Technology and Fabrication of New Display Devices
Speaker
Jianping Liu
Professor of Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences

Biography:Jianping Liu earned his doctoral degree from Institute of Semiconductors, Chinese Academy of Science in 2004. He worked at Lab of Optoelectronics Technology at Beijing University of Technology from 2004 to 2006. He did postdoctoral research in Department of Electrical Engineering at Georgia Institute of Technology from 2006 to 2010. He then joined Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, as a professor. His research interests include MOCVD growth, GaN-based materials and devices. He has been working on GaN-based laser diodes, LEDs and HEMTs. He has achieved the first GaN-based green LD in China. He has published more than 100 peer-reviewed journal papers, including those published in top journal such as Light: Sci & Appl.、Nature Photonics、Appl. Phys. Lett.、Optical Express.

Abstract:Considerable attention has been focused on GaN-based laser diodes (LDs) during the past few years due to the demand for high-performance LDs in pico-projectors and laser displays. One of the main difficulties to develop high-performance GaN-based green LDs is high density of defects in active region, which results not only from large lattice mismatch between high In content InGaN QWs and GaN, but also from large thermal budget imposed on InGaN QWs during epitaxial growth of p-type AlGaN cladding layers. Moreover, p-type AlGaN cladding layers are main origin of internal loss and series resistance for GaN-based LDs. In this work, in order to overcome the above-mentioned problems of p-type layers, indium tin oxide (ITO) was used as cladding layers of GaN-based LD structures. With this hybrid LD structure, blue LDs with output power of 5W at a current of 3A and wall plug efficiency of 40% have been achieved. Moreover, green LDs have been achieved with low threshold current density as low as 1.6 kA/cm2, which is only one third of that of the conventional LD structure. As a result, green LDs with output power more than 1W has been obtained. These results indicate that a hybrid LD structure can pave the way toward high-performance green LDs. The application of GaN-based LDs in communication will be discussed.

The 13th Forum on Semiconductor Devices and Fabrication Technology——Key Technology and Fabrication of New Display Devices
Speaker
Mingwei Ge
General Manager Assistant of Product Engineering Center of Visionox Technology, Inc.

Biography:Assistant General Manager of Product Engineering Center at Visionox Technology Co., Ltd., Mainly responsible for Electronic design platform, Module design platform, and Design teams of module factories in Hefei and Guangzhou.

Participate in the specification formulation and design of the first AMOLED driver IC in Chinese Mainland, participate in the product design of the first mass production AMOLED and the development of related equipment, and understand the development trend of related product drivers and power chips.

Abstract:With the continuous progress of the display industry, AMOLED displays have gradually replaced LTPS as the mainstream in the field of small and medium-sized screens. New product technologies have also been added year by year, and the support of new technologies has enabled the accompanying driver IC to continuously iterate in the past several years.

This article is mainly based on the current development status of AMOLED, introducing the technical status、specification requirements、and localization progress of driver IC at the current stage. At the same time, combined with the layout of AMOLED new production lines and technologies in the existing display industry, it speculates on the future development direction of driver IC, and puts forward expectations for the discovery of related chip industries in the future. 

The 13th Forum on Semiconductor Devices and Fabrication Technology——Key Technology and Fabrication of New Display Devices
Speaker
Zhijian Lv
Deputy Director of Shenzhen Technology University

Biography:Dr. Zhijian Lv received his B.S. degree in telecommunications from Huazhong University of Science and Technology in 2011, M.S. degree and Ph.D. degree in Electrical Engineering from Arizona State University in 2014 and in 2017, respectively. He worked at Analog Devices Inc on high-voltage automobile and industrial PMICs design from 2017 to 2018. He was a research assistant professor of Electrical and Electronic Engineering at Southern University of Science and Technology, where he joined the faculty on April 2019. Meanwhile, he joined Shenzhen Sitan Technology CO., LTD. as a design manager for AR/VR Micro-LED display. Since September 2021, Dr. Zhijian Lv is currently a deputy director in Sino-German Intelligent Manufacture College at Shenzhen Technology University.

Dr. Zhijian Lv’s research interests are in the area of circuits and systems, communications systems, and ICs. His current research projects involve Micro-LED and LCoS display drive ICs and system, PMICs, LDO, and DC/AC inverter. He has published 45 journal papers and 46 patents with a total citation over 1300.

Abstract:AR/VR is an important human-computer interaction platform for the metaverse, and optical components and micro displays are key to image quality. As two key technologies for micro displays, the report will offer a brief introduction to the structure, manufacturing process, silicon-based driving method, progress, and challenges in the areas of silicon-based Micro-LED and silicon-based liquid crystal on silicon (LCoS) micro displays. In the section of silicon-based driving circuits and ICs, the report will emphasize the driving design and challenges from the perspective of the latest projects. Finally, the report will discuss the hot topics and future trends of Micro-LED and LCoS silicon-based driving circuits and chips.

The 13th Forum on Semiconductor Devices and Fabrication Technology——Key Technology and Fabrication of New Display Devices
Speaker
Yongxin Cui
Director of R&D of Chengdu Vistar Optoelectronic Co., Ltd.

Biography:1. Served as the company’s Director of R&D, led the planning, equipment evaluation and construction of the company’s Micro-LED pilot production line.

2. Led the company’s Micro-LED TFT backplane, mass transfer, detection, repair, encapsulation and module technology planning and landing.

3. Applied for 59 patents.

Abstract:Introduce the development of Micro-LED display technology industry and the progress of Vistar. A solution to the bottleneck of mass transfer technique in Micro-LED display technology is presented. The application of laser-assisted bonding technique in Micro-LED display is introduced in detail, and its effectiveness in achieving high productivity and low cost bonding is demonstrated. Meanwhile, the development of TFT-based Micro-LED display project of Vistar is introduced.

The 13th Forum on Semiconductor Devices and Fabrication Technology——Key Technology and Fabrication of New Display Devices
Speaker
Wei Yin
Associate Professor of Nanjing University of Science

Biography:Dr. Wei Yin is an associate professor in optical engineering, Nanjing University of Science and Technology (NJUST), China. His research interests include optical metrology, optical 3D measurement and imaging, fringe projection profilometry, speckle projection profilometry, and deep learning. He is an author of more than 20 journal papers and 10 proceedings conferences related to 3D imaging and high-level tasks directly to optical metrology. Recently, he developed real-time, high-accuracy, long-range, and miniaturized 3D sensors with a VCSEL projector array or a MEMS projector.

Abstract:With the rapid development of optoelectronic information technology, three-dimensional (3D) imaging and sensing has become a research forefront in optical metrology. Fringe projection profilometry (FPP) is one of the most representative 3D imaging technologies due to its non-contact, high-resolution, high-speed, and full-field measurement capability. In recent years, with the rapid advances of optoelectronic devices and digital signal processing units, people subsequently set higher expectations on FPP: it should be both “high precision” and “high speed. While these two aspects seem contradictory in nature, “speed” has gradually become a fundamental factor that must be taken into account when using FPP, and high-precision 3D reconstruction using only one single pattern has been the ultimate goal of structured light 3D imaging in perpetual pursuit. Nowadays, deep learning technology has fully “permeated” into almost all tasks of optical metrology. In this talk, we introduce our recent efforts to apply deep-learning approaches to FPP. We show that the deep-learning-enabled fringe analysis approach can significantly boost the accuracy and improve the quality of the phase reconstruction compared to conventional single-fringe phase retrieval approaches. Deep learning can also be used to achieve single-frame, high-precision, unambiguous 3D shape reconstruction, which is expected to fill the speed “gap” between 3D imaging and 2D sensing and enables FPP techniques to go a step further in high-speed and high-accuracy 3D surface imaging of transient events.

The 13th Forum on Semiconductor Devices and Fabrication Technology——Key Technology and Fabrication of New Display Devices
Speaker
Xiaodong Zhang
Professor of Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences

Biography:Prof. Xiaodong ZHANG received Ph.D. degree from University of Science and Technology of China, the National Labor Medal, the Chinese Academy of Sciences Technical Support Talent, Promising Youth of Suzhou, etc. He joined the Nano-Fabrication Facility of SINANO, CAS, in 2007, where has been engaged in the research and development of semiconductor materials, devices, and processes for a long time, including Gallium Nitride Micro-LED and HEMT devices, Ultra-Wide Bandgap Semiconductor Gallium Oxide, Hexagonal Boron Nitride, Aluminum Nitride epitaxial film growth, power electronics and optoelectronic devices, and characteristic research. In recent years, he has published more than 80 SCI papers in international mainstream journals, and applied for more than 40 domestic and foreign invention patents.

Abstract:With the continuous development of Extended Reality (XR) technology including Augmented Reality (AR), highly miniaturization and integration have become the main development trend in the display field, and GaN Micro-LED is considered as the most promising advanced display technology in the future. This report introduces Micro-LED display technology in terms of its related technologies, as well as an open 8-inch Micro-LED processing on the Nanofabrication platform, and discusses the future development of Micro-LED displays.

The 13th Forum on Semiconductor Devices and Fabrication Technology——Key Technology and Fabrication of New Display Devices
Speaker
Chunhong Zeng/Wenkui Lin
Associate Professor of Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences/ Associate Professor of Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), Chinese Academy of Sciences

Biography:Chunhong Zeng is a senior engineer master supervisor and the head of the Nano-Fabrication Facility at Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences (CAS). She received his master’s degree in 2007 and her doctoral degree in 2022 from Changchun University of Science and Technology. In April 2007, She joined Suzhou Institute of Nano-Tech and Nano-Bionics. She has been dedicated to the research of wide bandgap semiconductor optoelectronic and electronic devices. She has applied for more than 10 national patents, and published more than 10 papers in academic journals such as IEEE Trans Electron Devices, IEEE Electron Deivce Lett, and Electron Lett.

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