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Conference Introduction

Since its invention in 1995, nanoimprint technology has undergone more than three decades of innovation and industrial development. With advantages of high resolution, low cost, and high throughput, it has become a key technology in micro- and nanofabrication and an important pathway beyond the limits of conventional photolithography. According to TechNavio, the global nanoimprint market is expected to reach USD 3.3 billion by 2026, driven by growing applications in memory chips, AR/VR optical waveguides, and advanced packaging.


Focusing on the theme “Strengthening the Industrial Ecosystem and Accelerating Technology Commercialization”, NTAC 2026 aims to promote the integration of nanoimprint technologies across the entire value chain, from materials and equipment to industrial applications. The conference will bring together experts and industry leaders to explore advances in key materials, manufacturing processes, and emerging applications, with a focus on sectors including semiconductors, AR/VR optics, and biomedical technologies, accelerating the commercialization and industrial adoption of nanoimprint technology.

Conference Organizers

Organization

Host

    • Gusu Lab

Organizers

    • Suzhou New Dimension Nano Technologies Co., Ltd.
    • Nanopolis Suzhou Co., Ltd.

Co-organizers

    • Puyu Technology (Suzhou) Co., Ltd.
    • Shanghai PureChip Technology Co., Ltd.

Supporting Agency

    • Optical Components and Optical Instruments Branch, China Optics and Optoelectronics Manufacturers Association（COEMA）

Main topics

2026 Agenda Overview

2026 Agenda Overview

Date: Oct. 21
Location: A109, Suzhou International Expo Center
Moderator: Yifang Chen
Date: Oct. 22
Location: A109, Suzhou International Expo Center
Moderator: Lars Montelius
Date: Oct. 22
Location: A109, Suzhou International Expo Center
Moderator: Gang Luo
The 4rd Global Nanoimprint Technology and Application Conference
Wenqing Xu
（ Executive Deputy Director of Gusu Lab）
The 4rd Global Nanoimprint Technology and Application Conference
Gang Luo
（ General Manager of Suzhou New Dimension Nano Technology Co., Ltd. ）
In high-precision micro-nano manufacturing, conventional photolithography suffers from critical pain points including enormous capital investment for equipment, high process costs and stringent technical barriers for mass production. As a high-performance alternative technical route, nanoimprint lithography can meet the development requirements of various high-precision micro-nano devices, featuring prominent industrial advantages of low cost and high-volume scalable manufacturing. Based on hands-on industrial practice, the sector faces a common practical contradiction: although process metrics are impressive at the laboratory stage, numerous engineering challenges remain during the transition to industrial mass production. To address these industry pain points, our company has established a domestic full-ecosystem nanoimprint manufacturing platform. Its capabilities span the entire workflow: template fabrication, process development, new-product R&D, production-line construction and high-volume manufacturing. The platform supports R&D iteration, prototype verification and scaled deployment of micro-nano devices, breaking down core barriers between technology R&D and commercial mass production. Our business covers key sectors including AI optical communication, lasers, AR/VR, biomedicine, displays and advanced packaging. Through one-stop high-precision process services, we tackle common industrial challenges such as difficult technology deployment, persistently high mass-production costs and slow new-product iteration and translation. The themed presentation From Template to Mass Production: Building a Full-Ecosystem Nanoimprint Manufacturing Platform will be delivered at the 2026 China International Optoelectronic Exposition (CIOE) in Shenzhen. From the dual perspectives of industrial practice and market demand, it discusses the commercialization pathway for cost reduction and efficiency gain via nanoimprint lithography, from template development through high-volume mass production.
Gang Luo, PhD in Physics from Lund University, Sweden, and PhD in Chemistry from Peking University. He studied under Professor Lars Montelius, the European founding father of nanoimprint lithography, as well as Academicians Zhongfan Liu and Jin Zhang. He is currently Founder and General Manager of Suzhou New-Dimension Micro-Nano Technology Co., Ltd., and Leader of the Technical Group at Gusu Laboratory of Materials Science. Previously, he worked as Nanoimprint Technology Specialist at Obducat Technologies AB in Sweden. He led multiple EU Framework Programme projects and spearheaded the R&D of the first mass-production nanoimprint lithography tool, driving the company’s strategic transformation. Having long devoted himself to nanoimprint technology, he founded New-Dimension Micro-Nano in 2022 to advance the industrialization of nanoimprint lithography and micro-nano components. The company has built a wafer-scale nanoimprint fabrication platform capable of 20 nm feature patterning and mastered processing workflows for multi-material systems. He has been selected for the National Torch Program and honored as National High-Level Talent, Gusu Leading Entrepreneurial Talent, and SIP Leading Talent in Science and Technology. He has published more than 10 academic papers and holds 8 invention patents.
The 4rd Global Nanoimprint Technology and Application Conference
Linsen Chen
（ Professor of Soochow University, President of SVG Tech Group Co., Ltd.）
Dr. Chen is a Research Fellow and Doctoral Supervisor at Soochow University, as well as an expert receiving special government allowances from the State Council. He’s focused on the research and applications of micro-nano optics and flexible manufacturing, upstream materials and devices for new displays, and digital lithography & nanoimprint technology. He has presided over major projects including the National 863 Program, National Major Scientific Instrument and Equipment Special Project, and Key Projects of the National Natural Science Foundation of China. He has made systematic and pioneering contributions in areas such as 3D lithography technology and equipment, roll-to-roll nanoimprint technology and processes, micro-nano optical materials and devices, and new display technologies, with his research results widely applied at home and abroad. As the principal investigator, he has successively won 3 Second Prizes of the National Science and Technology Progress Award, 5 First Prizes of the Jiangsu Provincial Science and Technology Award, the Special Prize of the National "Award for Outstanding Individuals in Invention and Entrepreneurship" (and was awarded the title of "Contemporary Inventor"), and the 4th "Outstanding Engineer Award". He has published more than 190 papers in journals such as Light, PRL, Adv. Mater., EES, and Optica, and holds over 200 invention patents (7 have won the China Patent Excellence Awards). He is the founder of Suzhou SVG Tech Group Co., Ltd. (listed on the ChiNext Market) and currently serves as the chief scientist presiding over a National Key R&D Program project.
The 4rd Global Nanoimprint Technology and Application Conference
Yifang Chen
（ Professor of Fudan University）
Nanoimprint lithography (NIL) and electron beam lithography (EBL) are currently still the most popular technique for fabrications of nanostructures, nanodevices and nanosystems, supporting fundamental research toward industrialization. In this talk, I will first give a short review of basic R&Ds in NIL in China. Then, I will introduce you some encouraging progress of EBL, achieved by using home-made e-beam writers. Finally, I shall report the latest achievements in the nanofabrications of X-ray zone plates for X-ray microscopy in my group in the past years, which enables us to stand in the world advanced position.
Prof. Yifang Chen, received his D.Phil degree in 1995 in Condensed Matter Physics in Oxford. After working at Delft University of Technology (1994-1996), Nanyang Technological University (1996) and University of Glasgow (1997-2002), he became a senior and then promoted to be a principal scientist, based on his personal merit at Rutherford Appleton Laboratory (2003-2012), meanwhile visiting professor in École Polytechnique Fédérale de Lausanne (2010) and visiting senior scientist in National Physical Laboratory, UK (2016-2019). In 2012 he joined Fudan University with national high-end talent plan and received a special government allowance of the State Council in 2018. Dr. Yifang Chen has been dedicated in nanofabrication and applications since 1990, spanning electron beam lithography/nanoimprint lithography/dry-etch for nano-photoelectronic devices, high electron mobility transistors (HEMTs), X-ray Fresnel zone plates, metasurface and nanophotonics, etc. Based on EBL, his team have established a complete and reliable nanofabrication foundation of X-ray components for X-ray microscope with 10 nm resolution and high efficiency, routinely supporting national synchrotron radiation facilities and laboratory-stage X-ray nano-CTs. He has published 170 scientific papers and owns 10 patents in X-ray optics. He is an associate editor of both Microelectronic Engineering and Micro Nano Engineering under the umbrella of Elsevier.
The 4rd Global Nanoimprint Technology and Application Conference
Yong Chen
（ Professor of École Normale Supérieure (ENS), France）
From our early contributions to nanoimprinting to our recent work in biomedical applications, micro- and nanoscale fabrication has remained a recurring theme in our research. This invited talk will trace that evolution, connecting the development of fabrication methods with the scientific questions and application needs that have shaped our work. The presentation will begin with a brief account of our early contributions to the field, highlighting the motivations and physical concepts underlying these developments. The main focus will then shift to recent research involving nanoembossing and related approaches, with particular emphasis on biomedical applications. Selected examples will illustrate how material deformation, interfacial interactions, and mechanical constraints govern the formation and integration of micro- and nanostructures. These examples will provide a basis for discussing the connections between fabrication strategies, structural properties, and biological functions. The presentation will conclude with reflections on the challenges and opportunities ahead, exploring how physical insight, artificial intelligence, and biomedical questions can jointly guide the development of micro- and nanofabrication.
Yong Chen is a research director (Emeritus) at the French National Center for Scientific Research (CNRS) and the Ecole Normale Supérieure (ENS, Paris). In the past, he also served as a Professor of ENS, an Adjunct Professor at Kyoto University, a Lecture Professor at Peking University, and a Distinguished Chair Professor at Hong Kong Polytechnic University. After working in different fields of condensed matter physics and nanotechnologies for over 20 years, he has been focused on in vitro models and organ-chip systems for both academic and industrial interests.
The 4rd Global Nanoimprint Technology and Application Conference
Jicheng Feng
（ Professor of ShanghaiTech University）
We stand at a critical crossroads in the development of integrated circuits. As conventional lithography struggles in the face of physical limits and astronomical costs, must we merely compete along this old "top-down" path? This presentation introduces a transformative technology that may break the deadlock: Faraday 3D Printing. It represents a fundamentally different manufacturing paradigm. Abandoning complex optical systems and vacuum environments, it employs precisely controlled electric fields as a "brush" to directly "draw" three-dimensional nanostructures under ambient pressure. This is a bottom-up atomic-level assembly method, enabling the free use of diverse materials including metals, semiconductors and even high-entropy alloys to directly print high-performance interconnects, transistors and even full 3D systems on wafers. Our research has demonstrated that this new pathway is not far out of reach: we have achieved ultra-fine linewidths below 10 nm, rapid wafer-scale fabrication within one hour, and successfully printed key devices. This is more than a simple replacement of manufacturing methods; it opens the door to atomic-level manufacturing and multi-functional heterogeneous integration. This talk will delve into the core principles of this technology, its exciting breakthrough applications, and discuss how, as a Chinese solution for the post-Moore era, it can inject fresh vitality and boundless possibilities into next-generation chip manufacturing.
Jicheng Feng, recipient of the National High-Level Young Talent Program and Shanghai Overseas High-Level Talent Introduction Program. He is Researcher, PhD Supervisor and AIL Group Principal Investigator at Shanghai Tech University, and Editorial Board Member of Aerosol Research. His research centers on micro/nano and atomic-level manufacturing systems and equipment. As first inventor, he has filed 25 invention patents (4 PCT). He leads multiple national and provincial projects. His works are published in Nature, Matter, Advanced Materials etc., with several cover articles and highlighted commentaries in Nature Electronics, Nature Communications and Matter.
The 4rd Global Nanoimprint Technology and Application Conference
Zhongwang Wang
（ Associate Research Fellow of Suzhou National Laboratory）
Optical metamaterials, with their capability to precisely modulate the phase, amplitude and polarization of optical fields via subwavelength structures, have emerged as a core enabling technology for next-generation planar optical systems. However, as metamaterials evolve toward integration, multi-functionality and commercialization, their fabrication technologies and processes are confronted with mounting challenges. Based on the structural characteristics and development trends of metamaterials and metasurfaces, this report sorts out the challenges facing their fabrication technologies and analyzes the processing routes and industrialization prospects.
He received his PhD from Japan Advanced Institute of Science and Technology (JAIST). He completed a one-year joint training program at RIKEN. From 2020 to 2022, he worked as a postdoctoral researcher at Central South University. After completing his postdoctoral appointment, he joined Raith, where he was responsible for application support and training of electron beam lithography technology. He is currently an Associate Researcher at Suzhou National Laboratory. As the first author, he has published more than 10 research papers in journals including Advanced Materials, ACS Nano, and Applied Physics Letters. He has been awarded two provincial-level research grants: Hunan Provincial Youth Fund and Hunan Outstanding Postdoctoral Innovative Talent Program.
The 4rd Global Nanoimprint Technology and Application Conference
Peng Qi
（ Associate Scientist of ShanghaiTech University）
Micro/nano fabrication platforms integrate a wide range of equipment and complex processes. However, fragmented knowledge, siloed data, and heavy reliance on manual coordination make it difficult to efficiently integrate and continuously accumulate platform capabilities. This report presents the overall vision and construction outcomes of AgenticLitho: by connecting domain knowledge, equipment capabilities, process flows, and experimental data through AI agents, it drives the entire micro/nano fabrication platform toward an agent-driven automated architecture. The goal is to let optical fabrication requirements from large scientific facilities reach the fabrication platform directly, with agents collaborating to complete requirement interpretation, process planning, tool invocation, execution coordination, and result analysis, while converting experimental feedback into traceable, reusable process knowledge. The report will discuss the platform architecture, equipment interfaces, and human–machine collaboration mechanisms required to realize this vision, exploring—under human supervision and review at critical checkpoints—the gradual establishment of a closed loop that runs from fabrication intent, through experimental execution, to knowledge updating. This will enable the platform to continuously accumulate experience, optimize processes, and collaboratively accomplish complex fabrication tasks, ultimately bridging intelligent manufacturing with scientific research needs.
Peng Qi, Associate Researcher at the Large Science Center and Academic Mentor at the Materials and Devices Center, ShanghaiTech University. Recipient of the Shanghai Overseas High-Caliber Talent Program. Principal Investigator of the Shanghai Pujiang Talent Program and the ShanghaiTech AI Innovation Program. He earned his PhD from the Canadian Light Source. He completed postdoctoral research at Argonne National Laboratory (USA) and Paul Scherrer Institute (Switzerland). His long-standing research covers X-ray optics, microscopic imaging and nanofabrication, bridging optical design, device fabrication and system applications. He pioneered novel optical components including on-chip integrated achromatic X-ray lenses and X-ray diffractive axicons. His research findings have been published in journals such as Light: Science & Applications and Optica. Relevant work was selected as a 2023 Research Highlight by the Swiss Nanoscience Institute. In recent years, he has focused on deep integration of AI agents and nanofabrication to advance intelligent and automated transformation of nanofabrication platforms.
The 4rd Global Nanoimprint Technology and Application Conference
Nanopolis Suzhou Co., Ltd.
（ President of Shenzhen Micro-Nano Manufacturing Industry Promotion Associa）
Abstract of Speech：Since 2018, the Promotion Association has continuously tracked the industrialization process of micro-nano imprint technology globally, especially in China. It has released multiple issues of the Industrialization Research Report on Nanoimprint Technology (Patents) and more than ten observation articles, building a communication bridge between nanoimprint enterprises, investment institutions, and application clients. In this speech, the Promotion Association will share several insights on the industrialization of this technology gained from its observation and research.
The 4rd Global Nanoimprint Technology and Application Conference
Lars Montelius
（ Former Director-General of International Iberian Nanotechnology Laboratory, Professor Emeritus of Lund University）
Semiconductors power virtually all modern technologies — from smartphones and AI data centers to electric vehicles (EVs), industrial automation, and medical devices. As more industries digitize and automate, the need for advanced chips grows. AI Boom: Training and running large AI models (like ChatGPT) require massive computational power, driven by GPUs and AI-specific chips. EV & Mobility Shift: Electric and autonomous vehicles need significantly more chips than traditional cars — for sensors, power management, infotainment, etc. IoT Growth: Billions of devices (smart homes, factories, etc.) are connecting to the internet, all requiring semiconductors. Geopolitical tensions expose the fragility of the global chip supply chain. Today we witness an increased interest for national manufacturing capabilities of critical products. In addition, there is a worldwide increased political instability. Semiconductors are now considered strategic assets — much like oil in the 20th century. Hence, we have lately observed that the global geo-political landscape is rapidly changing. But even larger, and a necessity for a sustained and prosperous life at our planet Earth, is the absolute requirement for a green transition to be able to become a sustainable society. These major societal developments challenge society at large and will in turn impose challenges to the present higher education systems as well as the industrial society. And to accelerate the transformation from inventions into the needed disruptive innovations, there is a need for transversal interdisciplinary collaborative actions. Nanotechnology is a Key Enabling Technology with promises for making solid contributions to the grand societal challenges of today, offering possibilities to address solutions for enabling eg. sustainable energy supply on demand, clean water to everyone, novel e-care and e-health paradigms etc. Especially, Nanoimprint Lithography can be of uttermost importance to enable the creation of a greener semiconductor fabric. Hence, there are urgent needs – and consequently opportunities - for novel solutions and incentives to recruit needed trans-disciplinary engagements and closer collaboration with the industrial fabric and with society at large. Simply put, there is a need to join forces to create a global systemic and inclusive Science, Technology, Society and Innovation pathway for People, Planet and Prosperity.
Department of Physics, Division of Solid State Physics and NanoLund, the center for research, education and innovation within nanoscience at Lund University, Sweden. Former Director–General of the International Iberian Nanotechnology Laboratory, headquartered in Braga, Portugal.
The 4rd Global Nanoimprint Technology and Application Conference
Feng Luo
（ Dean of the School of Instrument Science and Opto-Electronic Engineering, Hefei University of Technology）
Single-crystal diamond has a high Young’s modulus and favorable optical properties and can host solid-state spin defects such as nitrogen–vacancy (NV) centers, making it an important material for scanning probes and quantum devices. Its hardness and chemical stability, however, also make micro- and nanofabrication challenging. These requirements present two main fabrication challenges: coordinating material removal across different length scales with precise pattern transfer, and balancing machining efficiency, thickness accuracy, and structural stability during the fabrication of ultrathin cantilevers. This presentation addresses these challenges through process development, structure fabrication, and performance evaluation of multilevel single-crystal diamond micro/nanostructures and ultrathin scanning probes. A multilevel hard-mask pattern transfer process and a combined laser–focused ion beam (FIB) machining process were developed.
Professor Feng Luo, Dean of the School of Instrument Science and Opto-electronic Engineering, Hefei University of Technology. He graduated from Peking University. His main research interests include extreme ultraviolet lithography (EUV), micro/nanofabrication, advanced semiconductor manufacturing processes, and device reliability, etc.
The 4rd Global Nanoimprint Technology and Application Conference
Ivan Xu
（ Marketing Director of Suzhou New Dimension Micro Nano Technology Co., Ltd.）
The 4rd Global Nanoimprint Technology and Application Conference
Mi Zhou
（ General Manager of Ningbo Merak Advanced Materials Technology Co., Ltd.）
Micro-nano optical materials are undergoing a paradigm shift from conventional "passive utilization" to artificial "active design". Its core development thread revolves around three major themes: novel functional material systems, disruptive manufacturing processes, and device integration ranging from microlenses to optical waveguides. Merak Advanced Materials supplies downstream enterprises including micro-nano and diffractive optical waveguide manufacturers, as well as electronic display producers. The company's products have found extensive applications in AR diffractive optical waveguides, 3D sensing microlens arrays and other fields. Combined with the development journey of Merak Advanced Materials, this presentation will thoroughly discuss the technological evolution path of micro-nano optical materials from microlenses to optical waveguides, and share the company's technical breakthroughs in continuously improving material performance, enhancing stability, and enabling scalable mass production.
Mi Zhou, General Manager of Ningbo Merak Advanced Materials Technology Co., Ltd., National High-Level Overseas Talent. He obtained his PhD from the National University of Singapore in 2010, and subsequently worked for BASF, a global chemical giant, for many years, holding positions as Senior Research Scientist and Senior Manager. To realize his vision of innovating high-performance optical materials, Dr. Zhou led the team to found Ningbo Merak Advanced Materials Technology Co., Ltd., focusing on the development and commercialization of high-performance interfacial optical materials. Long and deeply engaged in optoelectronic materials, he has published papers and obtained over 70 authorized patents. He has achieved several world-class breakthroughs in organic semiconductors and high-performance optical materials, winning high recognition and positive feedback from customers.
The 4rd Global Nanoimprint Technology and Application Conference
Wanyin Cui
（ General Manager of Nanoscribe GmbH & Co. KG）
This report introduces Nanoscribe's core Two-Photon Polymerization (2PP) and Two-Photon Grayscale Lithography (2GL) technologies. By enabling direct 3D printing with nanometer precision (Ra≤5nm) and over 4000-level dynamic grayscale control, it overcomes traditional lithography limits. The presentation covers the workflow from rapid prototyping and high-precision nanoimprint master fabrication to scalable wafer-level production.
Dr. Wanyin Cui holds a Ph.D. in Physics from KIT, Germany. With over 15 years in microfabrication, he deeply participated in developing the world's first commercial two-photon 3D microfabrication system (2PP technology), achieving sub-100nm precision and winning the SPIE Prism Award. As GM of Nanoscribe China, he drives the industrial-level validation and scalable production of this technology in micro-optics and photonics.
The 4rd Global Nanoimprint Technology and Application Conference
Pin Hu
（ General Manager of Morphotonics Nanoimprint Technologies (Suzhou) Co., Ltd.）
The 4rd Global Nanoimprint Technology and Application Conference
Patrik Lundström
（ CEO of Obducat Group）
The capabilities embedded in Obducat’s NIL technology enable multiple applications driven by AI, defense and healthcare. The ability to reproduce micro- as well as nano scale structures on an industrial scale transforms industries at an increasing pace. The merge between traditional Semiconductor technologies with Photonics will drive fundamental changes across the entire industry. Obducat’s NIL technology successfully combines industrial production with high yield levels, high pattern accuracy levels, repeatability and cost efficiency. Obducat puts focus on developing the capabilities further in the NIL technology space to support continued industrialization as the demand micro- and nano structuring capabilities continues to increase.
Patrik Lundström is the Chief Executive Officer of Obducat Group. He holds an MSc in Business Administration from Lund University. Patrik Lundström has more than 25 years’ experience from electronics and semiconductor industry with focus on management, sales, R&D as well as manufacturing. Patrik joined Obducat in 2000 and was appointed CEO in 2002. Before joining Obducat Patrik worked at Meget AB (now part of Assa Abloy), a leading player within the RFID industry. Early on Patrik worked with electronics manufacturing having the responsibility for a lithography department.
The 4rd Global Nanoimprint Technology and Application Conference
Guo Zhu
（ General Manager of Raith GmbH）
German-headquartered Raith is the global leader in maskless nanofabrication. Founded in 1980, the company generates annual revenue of over €200 million, with more than 1,300 installed systems worldwide and over 15,000 users. Its core technologies comprise electron-beam lithography (EBL, 5 nm resolution), laser-beam lithography (LBL, 200 nm), and ion-beam systems. The EBL portfolio, built around the EBPG and Voyager series and supported by FIREBIRD multi-core acceleration and the Nanosuite software (which enables circular and algorithmically generated patterns), is used for photonic devices such as metasurfaces, nanolenses, gratings, and waveguides. Laser systems—including the high-resolution PICOMASTER, the holographic master-making ATHOS, and the HoloSuite software library—target microlens arrays, microfluidics, diffractive optics, and security holograms. The company maintains its headquarters in Germany, multiple production facilities in the Netherlands, and experience centers in EMEA, the Americas, and Shanghai, China. We warmly welcome your inquiries and discussions.
Mr. Guo Zhu serves as Deputy General Manager of Raith China, responsible for the market development and sales management of the company's products. He has over 10 years of rich experience in products and technologies including electron-beam lithography and metrology, focused ion beam, laser direct writing, and nanoimprint lithography. With a particularly deep understanding of the application of these technologies in both scientific research and industry, he has been a strong driving force behind the adoption of micro/nano fabrication and metrology technologies across China's microelectronics, optoelectronics, optical communications, and AR/VR sectors.
The 4rd Global Nanoimprint Technology and Application Conference
Damon Deng
（ Nanjing University, General Manager of Prinano Technology Co., Ltd.）
Nanoimprint lithography has gradually entered advanced-node semiconductor manufacturing and become an important route in micro/nano fabrication. With the explosive growth of domestic optical communications and optical module industries, demand for high-precision, low-cost, high-throughput optical manufacturing has surged. Nanoimprint lithography demonstrates broad application prospects in optical chips, optical modules, optical waveguides, photonic chips, and other fields. Prinano Technology will share its technological progress, industrialization practices, and future roadmap, and explore how nanoimprint lithography can empower convergent innovation in semiconductors and optoelectronics.
Damon Deng is the founder and CEO of PRINANO, PhD candidate at Nanjing University, senior engineer, master’s degree from the USTC. With 15 years of deep involvement in the nanoimprint lithography area. Damon has worked at the Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO), the University of Hong Kong, San’an Optoelectronics, Nanodevice Solution Inc., and TZNano. In 2017, established PRINANO with Prof. Ge Haixiong of Nanjing University, focus on the closed-loop technological ecosystem industrialization of nanoimprint lithography.
The 4rd Global Nanoimprint Technology and Application Conference
Fanyue Li
（ Chairman of Shihu Technology (Nanjing) Co., Ltd.）
The rapid advancement of artificial intelligence has generated immense demand for micro-optics, spanning structures from nanoscale to microscale and even millimeter scale. Application scenarios include coupling gratings, waveguide optics, and metalenses in integrated optical chips for computing and storage, fiber/waveguide coupling in free space, as well as chip-scale imaging lenses for AI terminal products. However, these demands impose stricter requirements on micro/nano fabrication: high-precision transfer (relative error ≤ 1%), high yield (semiconductor-grade), packaging compatibility (supporting both W2W and C2W), and low cost (including both capital and manufacturing costs). ShiHu Technology has pioneered a thick-resist imprinting and atmospheric-pressure bonding technology that perfectly overcomes the above bottlenecks. Leveraging this technological advantage, it has also successfully resolved the temperature sensitivity issue of micro/nano optical components.
Mr. Fanyue Li is Chairman of Shihu Technology. He leads the team to conduct in-depth research in the field of wafer-level optics, focusing on the design, fabrication and application of core components. The core team brings together senior experts from cutting-edge fields including semiconductor fabs, optical device manufacturing and nanoimprint lithography, boasting profound technical know-how and extensive industrialization experience. Under his leadership, driven by technological innovation, Shihu Technology is rapidly growing into a new force propelling the development of the industry.
The 4rd Global Nanoimprint Technology and Application Conference
Shuxue Tu
（ Area Sales Manager of EV Group (EVG)）
The 4rd Global Nanoimprint Technology and Application Conference
Fayin Ju
（ Deputy General Manager of Jiangsu Youzhong Micro-Nano Semiconductor Technology Co., Ltd.）
Nanoimprint Lithography (NIL) is a high-resolution, low-cost micro/nano fabrication technique that transfers micro- and nanostructure patterns from a template onto a substrate. It can effectively break through the diffraction limit of conventional photolithography and the high-cost bottleneck of EUV lithography. Relying on proprietary core NIL technology, Jiangsu Youzhong Micro Nano Semiconductor Technology Co., Ltd. provides one-stop solutions covering equipment, materials and processes. The company supports 8-inch wafer processing, with imprint resolution below 10 nm and aspect ratio exceeding 5:1. It has independently developed anti-adhesion materials, high etch-resistance imprint resists, and soft mold resists with high Young’s modulus. Its products have been adopted in areas such as optical diffractive optical elements (DOE), metalenses, biochips, and reflective metal wire gratings. Faced with challenges including defect control, overlay accuracy and template lifetime, NIL is targeting “flanking battlefields” such as photonic chips, 3D NAND memory and advanced packaging. It is expected to evolve from an emerging alternative technology into a mainstream mature manufacturing process over the next decade. As a National Specialized and Sophisticated “Little Giant” Enterprise, Youzhong Micro Nano has more than 150 employees and over 50 intellectual property rights, and is committed to creating value for stakeholders.
Fayin Ju, Deputy General Manager of R&D at Jiangsu Youzhong Micro Nano Semiconductor Technology Co., Ltd. He has long been engaged in R&D and industrialization of semiconductor and micro/nano fabrication processes, with a background spanning materials, semiconductor processes and large-scale manufacturing. He currently oversees the company’s product development, process engineering and advanced technology innovation. His main research directions include semiconductor fabrication processes, micro/nanostructure patterning, nanoimprint lithography, key processes such as lithography, etching and thin-film deposition, as well as R&D and industrialization of micro-optical devices and biochips. He holds 27 granted patents (23 invention patents) and has participated in drafting 3 group standards.
The 4rd Global Nanoimprint Technology and Application Conference
Sven Cao
（ Sales Director of Simaxat Shanghai Company Limited）
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