Abstract of Speech：X-rays have a short wavelength and are not affected by the refractive index of air. Therefore, the use of X-ray interferometry enables atomic-scale resolution and accurate measurement at the nanoscale and below. This report mainly introduces the principle of X-ray interferometry and its key technical characteristics, as well as its applications in fields such as the precise measurement of fundamental physical constants in metrology, atomic-scale length primary standards, precise small-angle measurement, and high-resolution imaging of low-atomic-number materials. Finally, the report looks forward to the development trends and future application prospects of X-ray interferometry technology.

Abstract of Speech：With the advancement of science and technology, cross-scale micro-nano geometric reference materials are being further extended to the atomic scale, demonstrating broad development prospects in the fields of new products and new technologies. This progress has driven the application of cross-scale geometric metrology in key industries such as chips, industrial machinery, advanced manufacturing, and biomedicine. Therefore, systematic research on micro-nano geometric quantity carriers—including atomic-level reference materials, i.e., cross-scale micro-nano geometric reference materials—can meet the critical demands of national metrology institutions and the aforementioned industries for high-precision cross-scale micro-nano geometric reference materials. The research team has developed a series of cross-scale micro-nano geometric reference materials and integrated calibration structures, with plans to tackle challenges in the future in areas such as diverse types of atomic-level reference materials and online detection. This effort aims to improve the length measurement value transmission system in China, and provide metrology guarantee for improving the overall quality level of related micro and nano devices in China.

Abstract of Speech：Material specification standards provide consensus-based requirements and test methods for material properties, to reach consistency between buyers and sellers and between different sectors in the manufacturing, to facilitate the trade and quality control. Reliable supply of nanomaterials with assured quality is the foundation for most nanomanufacturing industry. However, compared with traditional materials, specifying nanomaterials faces challenges including unsettled nomenclature, categorization, testing protocols, and uncertainties in structure-performance correlation. The working group on material specification in the ISO technical committee Nanotechnologies (ISO/TC229/WG4), among others, has taken hierarchical approaches in developing nanomaterial specifications. Both general and specific type of documents have been published, which either simply list characteristics (blank-detail) or specify numerical values depending on the level of maturity. The current work program covers a wide range of chemical composition and physical form of nanomaterials. In this talk, we try to analyze the challenges in developing these documents, and provide perspective for future activities.

Abstract of Speech：The new generation of integrated circuits (IC) is a focal point for research and industrial development both domestically and internationally. The Nano-scale thickness of films is a fundamental and critical parameter in the IC industry, and its reliable measurement directly impacts product yield. This necessitates a standard system to ensure reliable and credible measurement results. This report outlines the establishment of a standard framework for the nano-scale thickness and details the development of reference materials for nano-scale thickness measurement.

Abstract of Speech：The quantized optical-lattice constant refers to the periodicity (lattice spacing) of the optical field formed when two or more phase-coherent lasers of identical frequency intersect at specific angles. In this talk, the presenter will describe how such a quantized optical-lattice constant is established using lasers locked to a chromium atomic transition frequency, and will explain direct traceability for grating reference materials, grating-interferometric metrology instruments, and value-assignment techniques for manufacturing wafer-scale reference standards. Typical applications across domestic and international metrology institutes, lithography systems, integrated-circuit dimensional metrology tools, and semiconductor fabs will also be discussed. Materialized, directly traceable reference materials, instruments, and wafer-scale standards based on the quantized optical-lattice constant are expected to enable a robust nanoscale length-metrology traceability chain.

Biography of the Speaker：Dr. Weixuan Jing is a Professor and Vice Dean of the School of Instrument Science and Technology at Xi’an Jiaotong University. He serves as a member of the National Technical Committee 336 on Micro-electro-mechanical Technology (SAC/TC336) and the National Technical Committee 240 on Geometrical Product Specification (SAC/TC240) of the Standardization Administration of China. He is also a Council Member of both the Chinese Society of Micro-Nano Technology and the Chinese Mechanical Engineering Society, as well as the Vice Chairman and Secretary-General of the Shaanxi Mechanical Engineering Society and the Executive Council Member and Deputy Secretary-General of the Shaanxi Association of Politically Unaffiliated Intellectuals. His research focuses on micro/nano electromechanical systems (MEMS/NEMS) and micro/nano sensing technologies. He led multiple national and provincial-level research projects, including 3 General Programs of the National Natural Science Foundation of China (NSFC), 2 subprojects under the National Key Research and Development Program of China, 3 projects founded by science and technology commission, 1 municipal project, 1 provincial project, and 1 subproject under major municipal science and technology project.He published more than 100 papers in SCI-indexed journals, including 14 in Chinese Academy of Sciences (CAS) Zone I journals and 19 in Zone II journals. He held 21 authorized national invention patents and 9 utility model patents, and presided over or participated in the formulation of 7 national standards. He received the Second Prize of the Science and Technology Progress Award from the Chinese Society for Measurement in 2016 as the first contributor, the First Prize of the China Machinery Industry Science and Technology Progress Award in 2021 as the second contributor, the First Prize of the Shaanxi Innovation and Entrepreneurship Competition for Scientific and Technological Workers in 2021 as the second contributor, and the First Prize of the Ministry of Education Science and Technology Progress Award in 2005 as a participant.

Abstract of Speech：Addressing the geometric-metrology needs of high-end equipment such as domestically developed lithography machines, industrial mother machines (foundational machine tools), and process instruments, this work focuses on enhancing grating-interferometry–based ultra-precision measurement in complex environments. It undertakes a systematic study of the theories and technologies for accuracy retention under multi-field coupling and for ensuring dynamic performance; provides a comprehensive analysis of the scope and capability limits of grating optical interferometric measurement; and identifies the theoretical bottlenecks and technical challenges facing the future development of ultra-precision gratings. By exploring breakthrough pathways in forward grating design, manufacturing processes, and signal interpretation, it seeks to advance new measurement paradigms for next-generation sub-nanometer gratings and to consolidate an independently controllable capability in grating interferometric metrology.

Abstract of Speech：The high-quality development of equipment and infrastructure in strategic national fields such as high-end equipment, new energy, and aerospace depends on the frictional and lubrication performance of the interface of tribol-pair in the core transmission components. Previously, the tribological and lubrication measurement technology and the metrological system were completely lacking in China. The standardized technologies and related testing and evaluation equipment were almost entirely dependent on imports from Europe and the United States, led to severe limitation the domesticization process. This report introduces the technical progress and intdustiral applications of the new-established metrology area: Tribological metrology area, and put forward to some visions for future development directions.

Abstract of Speech：As a critical quality infrastructure in the semiconductor industry chain, testing is providing precise data support for the research, development, and manufacturing of domestic semiconductor materials through advanced analytical technologies, driving the industry's transformation from import dependence to independent control. This report will focus on how the Physical and Chemical Analysis Laboratory of Shanghai Institute of Measurement and Testing Technology Co.,Ltd, taking national strategies as its responsibility and industrial demands as its orientation, applies ultra-trace detection technology in the semiconductor material industry chain to facilitate high-quality industrial development.

Abstract of Speech：For over 50 years, Moore's Law has been closely tied to the size of components used in integrated circuit manufacturing. The semiconductor manufacturing process has advanced by leaps and bounds from the micrometer scale to the nanometer scale, driving substantial gains in computer speed. Only accurate measurement paves the way for precise manufacturing. Therefore, how to accurately characterize the nanoscale dimensional features of semiconductor devices remains a critical issue in semiconductor manufacturing. This presentation outlines nanoscale metrology methods applied in semiconductor manufacturing, compares the advantages, disadvantages, and limitations of various technical routes, and finally highlights some key measurement challenges in the field.